Cctba Precursor
We studied the use of Co films deposited by plasma-enhanced atomic layer deposition (PEALD) using dicobalt hexacarbonyl tert-butylacetylene (CCTBA) as a precursor for Cu direct plating.
Cctba precursor. The publication database currently has 1509 entries. 1 Films Compositions 401 Precursors and Plasma Gases 73 Deposition Hardwares 238 Film and Plasma Characteristics 79 Theses. Electrical properties of PEALD Co films of sub- nm thickness were determined by assessing continuities, morphologies, and impurities.
USA Home > Product Directory > Materials Science > Micro/NanoElectronics > Vapor Deposition Precursors > CVD and ALD Precursors by Metal > Cobalt Materials Science Home Materials Science Products. C 12 H 10 O 6 Co 2. Characterized the physical and electrical properties of Co films deposited by MOCVD using CCTBA precursor, and.
Electronic Materials, Metal based Electronic Materials.
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